We are grateful for support from the United States Geological Survey (USGS) and Missouri Water Resource Research Center (MoWRRC) through Award Number G16AP00066, from the Great Rivers Cooperative Ecosystems Studies Unit through Award Numbers G21AC10041 and G21AC10446-00, from the National Science Foundation (NSF) Division of Chemical, Bioengineering, Environmental, & Transport Systems (CBET) Interfacial Engineering Program through Award Number 2131282 and Electrochemical Systems Program through Award Number 2219060, NSF Division of Civil, Mechanical, and Manufacturing Innovation (CMMI) Major Research Instrumentation Program through Award Number 2216026, NSF Division of Materials Research (DMR) Polymers Program through Award Number 2235161, NSF Division of Graduate Education NRT Program through Award Number 2243526 and from the American Chemical Society Petroleum Research Fund (ACS-PRF) through PRF# 65193-DNI5.
Our lab includes a fullly customizable atomic layer deposition (ALD) reactor, built and housed at the University of Missouri-Columbia. The reactor is equipped with gas channels for the simultaneous use of up to 7 precursors, and is expandable depending on the project needs. By using vapor-phase precursor exposures which undergo self-limiting surface reactions, we are able to deposit nanoscale thin films with atomic-scale control of thickness and composition. We accomodate substrates ranging from flat surfaces, to powders, to mechanical parts. alt="">